Liquid immersion lithography at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 435-446

  Hagiwara, Takuya ^a   Ishimaru, Toshiyuki ^a   Tsuji, Shou ^a   Fujii, Kiyoshi ^a   Itakura, Yasuo ^b   Wakabayashi, Osamu ^b   Kawasa, Youichi ^b   Egawa, Keiji ^b   Uchino, Ikuo ^b   Sumitani, Akira ^b   Saito, Yusuke ^c   Maeda, Kazuhiko ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b KOMATSU LTD   (Japan)

^c CENTRAL GLASS CO LTD   (Japan)

Author keywords

157 nm immersion lithography; BARRIERTA J25V; Immersion fluid; Michelson interferometer; Optical characteristics; Perfluoroether; Semi empirical molecular orbital method; Sensitivity characteristics

Indexed keywords

ETHERS; INTERFEROMETERS; LIGHT ABSORPTION; LIGHT TRANSMISSION; MOLECULAR STRUCTURE; REFRACTIVE INDEX;

IMMERSION FLUIDS; MICHELSON INTERFEROMETER; OPTICAL CHARACTERISTICS; PERFLUOROETHERS; SENSITIVITY CHARACTERISTICS;

PHOTOLITHOGRAPHY;

EID: 25144466876     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599379     Document Type: Conference Paper

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