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Physical Review B - Condensed Matter and Materials Physics

Volumn 74, Issue 20, 2006, Pages

Surface smoothness of plasma-deposited amorphous silicon thin films: Surface diffusion of radical precursors and mechanism of Si incorporation

(3) Valipa, Mayur S a Bakos, Tamas a Maroudas, Dimitrios a

a University of Massachusetts (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751183305 PISSN: 10980121 EISSN: 1550235X Source Type: Journal
DOI: 10.1103/PhysRevB.74.205324 Document Type: Article

Times cited : (12)

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