First-principles analysis of precursor-surface reaction pathways relevant to plasma deposition of silicon thin films

IEEE Transactions on Plasma Science

Volumn 33, Issue 2 I, 2005, Pages 230-231

  Bakos, Tamas ^a   Maroudas, Dimitrios ^a  

^a University of Massachusetts   (United States)

Author keywords

Chemisorption; Density functional theory; Hydrogen abstraction; Hydrogenated amorphous silicon thin films; Plasma CD; Surface reactions

Indexed keywords

AMORPHOUS SILICON; CHEMICAL BONDS; CHEMISORPTION; HYDROGENATION; PASSIVATION; SURFACE REACTIONS; THIN FILMS;

DENSITY FUNCTIONAL THEORY; HYDROGEN ABSTRACTION; HYDROGENATED AMORPHOUS SILICON THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 18844407811     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.845002     Document Type: Article

References (2)

1. M. C. Payne, M. P. Teter, D. C. Allan, T. A. Arias, and J. D. Joannopoulos, "Iterative minimization techniques for ab initio total-energy calculations: Molecular dynamics and conjugate gradients," Rev. Mod. Phys., vol. 64, pp. 1045-1097, 1992.
2. D. Maroudas, "Modeling of radical-surface interactions in the plasma-enhanced chemical vapor deposition of silicon thin films," Adv. Chem. Eng., vol. 28, pp. 251-296, 2001.