Strontium hafnate films deposited by physical vapor deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2527-2530

  McCarthy, I ^a   Agustin, M P ^b   Shamuilia, S ^c   Stemmer, S ^b   Afanas'ev, V V ^c   Campbell, S A ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

^b University of California   (United States)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Insulators; Metal oxide Semiconductor Structure (MOS)

Indexed keywords

CAPACITORS; ELECTRIC INSULATORS; MOSFET DEVICES; PERMITTIVITY; PHYSICAL VAPOR DEPOSITION; STRONTIUM COMPOUNDS;

BANDGAP; NANOCRYSTALS; STRONTIUM HAFNATE FILMS;

THIN FILMS;

EID: 33750922370     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.030     Document Type: Article

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