Structural investigations of aluminum-chromium-nitride hard coatings by Raman micro-spectroscopy

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2197-2202

  Kaindl, R ^a   Franz, R ^b   Soldan, J ^b   Reiter, A ^c   Polcik, P ^d   Mitterer, C ^b   Sartory, B ^a   Tessadri, R ^a   O'Sullivan, M ^d  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b UNIVERSITY OF LEOBEN   (Austria)

^c Balzers AG   (Liechtenstein)

^d PLANSEE SE   (Austria)

Author keywords

Coatings; Physical vapour deposition (PVD); Raman scattering; Structural properties

Indexed keywords

ALUMINUM COMPOUNDS; COMPRESSIVE STRESS; NITRIDES; PHYSICAL VAPOR DEPOSITION; RAMAN SCATTERING;

BIAS VOLTAGES; PREFERENTIAL ORIENTATION; STRUCTURAL PROPERTIES;

COATING TECHNIQUES;

EID: 33750796698     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.144     Document Type: Article

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