Statistical analysis of the effect of deposition parameters on the preferred orientation of sputtered AlN thin films

Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 118-123

  Pantojas, V M ^a   Otano Rivera W ^a   Caraballo, José N ^a  

^a UNIVERSITY OF PUERTO RICO AT CAYEY   (Puerto Rico)

Author keywords

Aluminum nitride; Deposition process; Sputtering; X ray diffraction

Indexed keywords

CORRELATION METHODS; CRYSTAL ORIENTATION; DEPOSITION; FUNCTIONS; GRAPH THEORY; MAGNETRON SPUTTERING; PARAMETER ESTIMATION; STATISTICAL METHODS; THIN FILMS; X RAY DIFFRACTION;

CRYSTAL ALIGNMENT; DEPOSITION PRESSURE; DEPOSITION PROCESS; SUBSTRATE TEMPERATURE;

ALUMINUM NITRIDE;

EID: 25644458249     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.087     Document Type: Article

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