Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Journal of Micromechanics and Microengineering

Volumn 16, Issue 8, 2006, Pages 1606-1613

  Takano, Nao ^a   Doeswijk, Lianne M ^a   Van Den Boogaart, Marc A F ^a   Auerswald, Janko ^b   Knapp, Helmut F ^b   Dubochet, Olivier ^c   Hessler, Thomas ^c   Brugger, Jürgen ^a  

^a EPFL   (Switzerland)

^b CSEM   (Switzerland)

^c Leister Process Technologies   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; FLUIDICS; LITHOGRAPHY; MASKS; MATHEMATICAL MODELS; MICROELECTRODES; PHOTORESISTS; POLYMETHYL METHACRYLATES;

COPPER EVAPORATION; INTEGRATED MICROFLUIDIC SYSTEMS; MICROSTENCIL LITHOGRAPHY;

ORGANIC POLYMERS;

EID: 33746316754     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/8/023     Document Type: Article

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