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Volumn 13, Issue 6, 2004, Pages 956-962

Microstenciling: A generic technology for microscale patterning of vapor deposited materials

Author keywords

Metallization; Microstenciling; Microsystems; Thin film deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; FABRICATION; GLASS; GOLD; METALLIZING; PHYSICAL VAPOR DEPOSITION; PLASMA ETCHING; POLYMERS; SILICON; SUBSTRATES; TITANIUM;

EID: 10944242323     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.838368     Document Type: Article
Times cited : (35)

References (13)
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    • "Microfabricated elastomeric stencils for micropatterning cell cultures"
    • A. Folch, B.-H. Jo, O. Hurtado, D. J. Beebe, and M. Toner, "Microfabricated elastomeric stencils for micropatterning cell cultures," J. Biomed. Mater. Res., vol. 52, pp. 346-353, 2000.
    • (2000) J. Biomed. Mater. Res. , vol.52 , pp. 346-353
    • Folch, A.1    Jo, B.-H.2    Hurtado, O.3    Beebe, D.J.4    Toner, M.5
  • 8
    • 0343932624 scopus 로고    scopus 로고
    • "Self-aligned 3D shadow mask technique for patterning deeply recessed surfaces of micro-electro-mechanical systems devices"
    • J. Brugger, C. Andreoli, M. Despont, U. Drechsler, H. Rothuizen, and P. Vettiger, "Self-aligned 3D shadow mask technique for patterning deeply recessed surfaces of micro-electro-mechanical systems devices," Sens. Actuators, vol. 76, pp. 329-334, 1999.
    • (1999) Sens. Actuators , vol.76 , pp. 329-334
    • Brugger, J.1    Andreoli, C.2    Despont, M.3    Drechsler, U.4    Rothuizen, H.5    Vettiger, P.6
  • 9
    • 0001176399 scopus 로고
    • "In situ grown-in selective contacts to n-i-p-i doping superlattice crystals using molecular beam epitaxial growth through a shadow mask"
    • G. H. Döhler, G. Hasnain, and J. N. Miller, "In situ grown-in selective contacts to n-i-p-i doping superlattice crystals using molecular beam epitaxial growth through a shadow mask," Appl. Phy. Lett., vol. 49, pp. 704-706, 1986.
    • (1986) Appl. Phy. Lett. , vol.49 , pp. 704-706
    • Döhler, G.H.1    Hasnain, G.2    Miller, J.N.3
  • 12
    • 10944246794 scopus 로고    scopus 로고
    • "An integrated plasma equipment - Feature scale model for the Bosch deep Si etch process"
    • IEEE Conf. Record - Abstracts
    • S. Rauf, P. L. G. Ventzek, and W. J. Dauksher, "An integrated plasma equipment - feature scale model for the Bosch deep Si etch process," Pulsed Power Plasma Sci., p. 474, IEEE Conf. Record - Abstracts 2001.
    • (2001) Pulsed Power Plasma Sci. , pp. 474
    • Rauf, S.1    Ventzek, P.L.G.2    Dauksher, W.J.3
  • 13
    • 0033715606 scopus 로고    scopus 로고
    • "A silicon shadow mask for deposition on isolated areas"
    • A. Tixier, Y. Mita, J. P. Gouy, and H. Fujita, "A silicon shadow mask for deposition on isolated areas," J. Micromech. Microeng., vol. 10, pp. 157-162, 2000.
    • (2000) J. Micromech. Microeng. , vol.10 , pp. 157-162
    • Tixier, A.1    Mita, Y.2    Gouy, J.P.3    Fujita, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.