Scatterometry measurements for process monitoring of polysilicon gate etch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3213, Issue , 1997, Pages 79-90

  Bushman, Scott ^a   Farrer, Steve ^b  

^a TEXAS INSTRUMENTS   (United States)

^b Bio Rad CD Systems   (United States)

Author keywords

Atomic force microscopy; Critical dimension; Metrology; Process control; Process monitoring; Scatterometry

Indexed keywords

ATOMIC FORCE MICROSCOPES; CRITICAL DIMENSION; ETCH PROCESSES; FILM STRUCTURES; GATE ETCH; IN LINES; METROLOGY; PATTERNED PHOTORESISTS; POLYSILICON GATE ETCH; PROCESS VARIATIONS; REFLECTION COATINGS; SCANNING ELECTRONS; SCATTEROMETER; SCATTEROMETRY; SIGNAL DIFFERENCES; SILICON DIOXIDES; ULTRA VIOLETS; WAFER PROCESSING;

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; CRYSTAL ATOMIC STRUCTURE; DIELECTRIC LOSSES; INTEGRATED CIRCUITS; LITHOGRAPHY; METEOROLOGICAL INSTRUMENTS; PH EFFECTS; POLYSILICON; PROCESS ENGINEERING; PROCESS MONITORING; QUALITY CONTROL; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS;

PROCESS CONTROL;

EID: 0001268891     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284624     Document Type: Conference Paper

References (5)

1. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, "A scatterometric sensor for lithography," in Manufacturing Process Control for Microelectronic Devices and Circuits, A. G. Sabnis, ed., Proc. SPIE 2336, pp. 37-49, 1994.
2. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, "Metrology of subwavelength photoresist gratings using optical scatterometry," J. Vac. Sci. Technol. Jul/Aug, pp. 1484-1495, 1995.
3. C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, and J. W. Hosch, "Multi-parameter cd measurement using scatterometry," in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, ed., Proc. SPIE 2725, pp. 698-709, 1996.
4. M. R. Murnane, C. J. Raymond, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, "Scatterometry for 0.24-0.70 μm developed photoresist metrology," in Integrated Circuit Metrology, Inspection, and Process Control IX, M. H. Bennett, ed., Proc. SPIE 2439, pp. 427-436, 1995.
5. S. Zaidi, S. L. Prins, J. R. McNeil, and S. S. H. Naqvi, "Metrology sensors for advanced resists," in Integrated Circuit Metrology, Inspection, and Process Control VIII, M. H. Bennett, ed., Proc. SPIE 2196, pp. 341-351, 1994.