Novel implementations of scatterometry for lithography process control

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 506-516

  Littau, Mike ^a   Raymond, Christopher J ^a   Gould, Christopher ^b   Gambill, Christy ^b  

^a NANOMETRICS INC   (United States)

^b INFINEON TECHNOLOGIES   (United States)

Author keywords

CD; Control; Diffract; Focus; Lithography; Metrology; Optical; Scatterometry

Indexed keywords

ALGORITHMS; LENSES; LIGHT SCATTERING; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

SCATTEROMETRY;

PHOTORESISTS;

EID: 0036030722     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473490     Document Type: Article

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