Optical scatterometry of quarter micron patterns using neural regression

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 526-537

  Bischoff, Jörg ^a   Bauer, Joachim ^a   Haak, Ulrich ^a   Hutschenreuther, Lutz ^a   Truckenbrodt, Horst ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Critical dimension; Diffraction; Neural networks; Optical metrology; Process control; Scatterometry

Indexed keywords

LEAST SQUARES APPROXIMATIONS; LIGHT SCATTERING; PHOTORESISTS; REGRESSION ANALYSIS; VECTORS;

OPTICAL SCATTEROMETRY;

NEURAL NETWORKS;

EID: 0032403168     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308764     Document Type: Conference Paper

References (13)

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11. Light scattering based micrometrology
12. Formulation for stable and efficient implementation of the rigorous coupled wave approach of binary gratings