-
1
-
-
0034763362
-
Asymmetric line profile measurement using angular scatterometry
-
C. J. Raymond, M. Littau, T. Pitts, P. Nagy, "Asymmetric line profile measurement using angular scatterometry," Integrated Circuit Metrology, Inspection and Process Control XV, Proc. SPIE 3332, 2001.
-
(2001)
Integrated Circuit Metrology, Inspection and Process Control XV, Proc. SPIE
, vol.3332
-
-
Raymond, C.J.1
Littau, M.2
Pitts, T.3
Nagy, P.4
-
2
-
-
0029346243
-
Metrology of subwavelength photoresist gratings using optical scatterometry
-
C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, J. R. McNeil, "Metrology of subwavelength photoresist gratings using optical scatterometry," Journal of Vacuum Science and Technology B 13(4), pp. 1484-1495, 1995.
-
(1995)
Journal of Vacuum Science and Technology B
, vol.13
, Issue.4
, pp. 1484-1495
-
-
Raymond, C.J.1
Murnane, M.R.2
Naqvi, S.S.H.3
McNeil, J.R.4
-
3
-
-
0034762594
-
Gauge control for sub 170 nm DRAM product features
-
N. Lafferty, C. Gould, M. Littau, C.J. Raymond, "Gauge Control for sub 170 nm DRAM Product Features," Proc. SPIE, Vol. 4344, 2001.
-
(2001)
Proc. SPIE
, vol.4344
-
-
Lafferty, N.1
Gould, C.2
Littau, M.3
Raymond, C.J.4
-
5
-
-
0001268891
-
Scatterometry measurements for process monitoring of polysilicon gate etch
-
S. Bushman, S. Farrer, "Scatterometry Measurements for Process Monitoring of Polysilicon Gate Etch," Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, Proc. SPIE 3213, 1997.
-
(1997)
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, Proc. SPIE
, vol.3213
-
-
Bushman, S.1
Farrer, S.2
-
6
-
-
0032624052
-
Scatterometry for post-etch polysilicon gate metrology
-
C. Baum, R. Soper, S. Farrer, J.L. Shohet, "Scatterometry for post-etch polysilicon gate metrology," Integrated Circuit Metrology, Inspection and Process Control XIII, Proc. SPIE 3677, pp. 148-158, 1999.
-
(1999)
Integrated Circuit Metrology, Inspection and Process Control XIII, Proc. SPIE
, vol.3677
, pp. 148-158
-
-
Baum, C.1
Soper, R.2
Farrer, S.3
Shohet, J.L.4
-
7
-
-
0033703132
-
Scatterometry for the measurement of metal features
-
C. Raymond, S. Farrer, S. Sucher, "Scatterometry for the measurement of metal features," Integrated Circuit Metrology, Inspection and Process Control XIV, Proc. SPIE 3998, pp. 135-146, 2000.
-
(2000)
Integrated Circuit Metrology, Inspection and Process Control XIV, Proc. SPIE
, vol.3998
, pp. 135-146
-
-
Raymond, C.1
Farrer, S.2
Sucher, S.3
-
8
-
-
0029277699
-
Sixteen-megabit dynamic random access memory trench depth characterization using two-dimensional diffraction analysis
-
Z. R. Hatab, J. R. McNeil, S. S. H. Naqvi, "Sixteen-megabit dynamic random access memory trench depth characterization using two-dimensional diffraction analysis," Journal of Vacuum Science and Technology B 13(2), pp. 174-182, 1995.
-
(1995)
Journal of Vacuum Science and Technology B
, vol.13
, Issue.2
, pp. 174-182
-
-
Hatab, Z.R.1
McNeil, J.R.2
Naqvi, S.S.H.3
-
9
-
-
0032632458
-
Specular spectroscopic scatterometry in DUV lithography
-
X. Ni, N. Jakatdar, J. Bao, C. Spanos, S. Yedur, "Specular spectroscopic scatterometry in DUV lithography," Proc SPIE 3677, pp. 159-168, 1999.
-
(1999)
Proc SPIE
, vol.3677
, pp. 159-168
-
-
Ni, X.1
Jakatdar, N.2
Bao, J.3
Spanos, C.4
Yedur, S.5
-
10
-
-
0141755001
-
-
Ph.D. Dissertation, University of New Mexico
-
R. H. Krukar, Ph.D. Dissertation, University of New Mexico (1993).
-
(1993)
-
-
Krukar, R.H.1
-
11
-
-
0032403168
-
-
J. Bischoff, J.J. Bauer, U. Haak, L. Hutschenreuther, H. Truckenbrodt, Proc SPIE 3332, pp. 526-537, 1998.
-
(1998)
Proc SPIE
, vol.3332
, pp. 526-537
-
-
Bischoff, J.1
Bauer, J.J.2
Haak, U.3
Hutschenreuther, L.4
Truckenbrodt, H.5
|