Scatterometry for post-etch polysilicon gate metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 148-158

  Baum, Chris C ^a   Soper, Robert A ^a   Farrer, Stephen ^a   Shohet, J Leon ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ETCHING; LIGHT SCATTERING; NONDESTRUCTIVE EXAMINATION; SILICON WAFERS; SPATIAL VARIABLES MEASUREMENT;

CRITICAL DIMENSION (CD) METROLOGY; PITCH MEASUREMENT; POLYSILICON GATE METROLOGY; SCATTEROMETRY;

LITHOGRAPHY;

EID: 0032624052     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350801     Document Type: Conference Paper

References (8)