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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1340-1343

High-voltage parallel writing on iron nitride thin films

(5) Farkas, N a Ehrman, J D a Evans, E A b Ramsier, R D a Dagata, J A c

a UNIVERSITY OF AKRON (United States)

b University of Akron (United States)

c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-VOLTAGE PARALLEL WRITING; MAGNETIC APPLICATIONS; SINGLE-STEP IMPRINTING METHODS;

ETCHING; IRON COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES; ZIRCONIUM COMPOUNDS;

THIN FILMS;

EID: 33745490784 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2167074 Document Type: Article

Times cited : (3)

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