Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3017-3020

  Yang, XiaoMin ^a   Eckert, Andrew ^a   Mountfield, Keith ^a   Gentile, Harold ^a   Seiler, Carl ^a   Brankovic, Stanko ^a   Johns, Earl ^a  

^a SEAGATE RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; ATOMIC FORCE MICROSCOPY; DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; ION BEAMS; MAGNETIC HEADS; MAGNETIC MOMENTS; MAGNETIC THIN FILMS; NICKEL ALLOYS; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS;

CRITICAL DIMENSIONS (CD); FOCUSED ION BEAMS (FIB);

MAGNETIC RECORDING;

EID: 0942267517     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1630331     Document Type: Conference Paper

References (7)

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