Local oxidation of metal and metal nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1879-1884

  Farkas, N ^a   Tokash, J C ^a   Zhang, G ^b   Evans, E A ^b   Ramsier, R D ^a   Dagata, J A ^c  

^a UNIVERSITY OF AKRON   (United States)

^b The University of Akron   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INJECTION PROCESS; METAL NITRIDE FILMS; TRAPPING SITES;

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; LITHOGRAPHY; NITRIDES; OXIDATION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

METALLIC FILMS;

EID: 4344581495     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1723269     Document Type: Conference Paper

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