Torque studies of large-area Co arrays fabricated by etched nanosphere lithography

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Weekes, S M ^a   Ogrin, F Y ^a  

^a UNIVERSITY OF EXETER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC ELEMENTS; MAGNETIZATION CONFIGURATION; MICROMAGNETIC SIMULATION; REACTIVE ION ETCHING (RIE);

BOUNDARY CONDITIONS; ETCHING; FUNCTIONS; LITHOGRAPHY; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; TORQUE;

COBALT;

EID: 20944438796     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1849665     Document Type: Conference Paper

References (7)

1. S. Sun, C. B. Murray, D. Weller, L. Folks, and A. Moser, Science 287, 1989 (2000).
2. M. J. Donahue and D. G. Porter, NISTIR 6376, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, 1999.
3. R. Hohne, C. A. Kleint, A. V. Pan, M. K. Krause, M. Ziese, and P. Esquinazi, J. Magn. Magn. Mater. 211, 271 (2000).
4. C. A. Ross, M. Hwang, and M. Shima, Phys. Rev. B 65, 144417 (2002).
5. H. P. Myers and W. Sucksmith, Proc. R. Soc. London, Ser. A 207, 427 (1951).
6. C. A. Ross, M. Hwang, and M. Shima, J. Magn. Magn. Mater. 249, 200 (2002).
7. J. I. Martin, J. Noguesb, K. Liu, J. L. Vicent, and I. K. Schuller, J. Magn. Magn. Mater. 256, 449 (2003).