The role of subsurface oxygen in the local oxidation of zirconium and zirconium nitride thin films

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 468-473

  Farkas, N ^a   Zhang, G ^b   Donnelly, K M ^a   Evans, E A ^b   Ramsier, R D ^a,b   Dagata, J A ^c  

^a UNIVERSITY OF AKRON   (United States)

^b University of Akron   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Anodization; Oxygen; Zirconium

Indexed keywords

ANODIC OXIDATION; ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; GROWTH KINETICS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NITROGEN; OXYGEN; PLASMAS; SOLID SOLUTIONS; ZIRCONIUM; ZIRCONIUM COMPOUNDS;

ANODIC GROWTH; NON-ASYMPTOTIC MATERIALS;

THIN FILMS;

EID: 1342281279     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01252-5     Document Type: Conference Paper

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