Superconformal electrochemical deposition of gold for metallization in microelectronic devices

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Hu, Zhongmin ^a   Ritzdorf, Tom ^a  

^a Semitool Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; ELECTRODEPOSITION; GOLD; METALLIZING; MICROELECTRONICS; THALLIUM;

GRAIN REFINER; MPS FUNCTIONS; SULFITE-BASED GOLD ELECTROLYTE; SUPERCONFORMAL ELECTROCHEMICAL DEPOSITION;

ELECTROCHEMISTRY;

EID: 33744825465     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2196670     Document Type: Article

References (35)

1. D. Edelstein, J. Heidenreich, R. Goldblatt, W. Cote, C. Uzoh, N. Lustig, P. Roper, T. McDevitt, W. Motsiff, A. Simon, J. Dukovic, R. Wachnik, H. Rathore, R. Schulz, L. Su, S. Luce, and J. Slattery, Tech. Dig. - Int. Electron Devices Meet., 1997, 773.
2. S. Venkatesan, A. V. Gelatos, V. Misra, R. Islam, B. Smith, J. Cope, B. Wilson, D. Tuttle, R. Cardwell, I. Yang, P. V. Gilbert, R. Woodruff, R. Bajaj, S. Das, J. Farkas, D. Watts, C. King, P. Crabtree, T. Sparks, T. Lii, C. Simpson, A. Jain, M. Herrick, C. Capasso, S. Anderson, R. Venkatraman, S. Filipiak, B. Flordalice, K. Reid, J. Klein, E. J. Weitzman, and H. Kawasaki, Tech. Dig. - Int. Electron Devices Meet., 1997, 769.
3. P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev., 42, 567 (1998).
4. P. Singer, Semicond. Int., 21, 90 (1998).
5. M. E. Gross, C. Lingk, W. L. Brown, and R. Drese, Solid State Technol., 42, 47 (1999).
6. R. Williams, Modern GaAs Processing Methods, Artech House, Boston, MA (1990).
7. K. Kondo, T. Matsumoto, and K. Watanabe, J. Electrochem. Soc., 151, C250 (2004).
8. T. P. Moffat, D. Wheeler, and D. Josell, J. Electrochem. Soc., 151, C262 (2004).
9. M. Hayase, M. Taketani, K. Aizawa, T. Hatsuzawa, and K. Hayabusa, Electrochem. Solid-State Lett., 5, C98 (2002).
10. Y. Cao, P. Taephaisitphongse, R. Chalupa, and A. C. West, J. Electrochem. Soc., 148, C466 (2001).
11. D. Josell, D. Wheeler, W. H. Huber, J. E. Bonevich, and T. P. Moffat, J. Electrochem. Soc., 148, C767 (2001).
12. A. C. West, S. Mayer, and J. Reid, Electrochem. Solid-State Lett., 4, C50 (2001).
13. T. P. Moffat, D. Wheeler, W. H. Hubber, and D. Josell, Electrochem. Solid-State Lett., 4, C26 (2001).
14. Y. H. Im, M. O. Bloomfield, S. Sen, and T. S. Cale, Electrochem. Solid-State Lett., 6, C42 (2003).
15. A. C. West, J. Electrochem. Soc., 147, 227 (2000).
16. M. Georgiadou, D. Veyret, R. L. Sani, and R. C. Alkire, J. Electrochem. Soc., 148, C54 (2001).
17. T. P. Moffat, J. E. Bonevich, W. H. Huber, A. Stanishevsky, D. R. Kelly, G. R. Stafford, and D. Josell, J. Electrochem. Soc., 147, 4524 (2000).
18. Y. Jin, K. Kondo, Y. Suzuki, T. Matsumoto, and D. P. Barley, Electrochem. Solid-State Lett., 8, C6 (2005).
19. M. Hasegawa, Y. Negishi, T. Nakanishi, and T. Osaka, J. Electrochem. Soc., 152, C221 (2005).
20. K.-C. Shim, H.-B. Lee, O.-K. Kwon, H.-S. Park, W. Kob, and S.-W. Kang, J. Electrochem. Soc., 149, G109 (2002).
21. D. Josell, S. Kim, D. Wheeler, T. P. Moffat, and S. G. Pyo, J. Electrochem. Soc., 150, C368 (2003).
22. T. P. Moffat, B. Baker, D. Wheeler, J. E. Bonevich, M. Edelstein, D. R. Kelly, L. Gan, G. R. Stafford, P. J. Chen, W. F. Egelhoff, and D. Josell, J. Electrochem. Soc., 149, C423 (2002).
23. B. C. Baker, M. Freeman, B. Melnick, D. Wheeler, D. Josell, and T. P. Moffat, J. Electrochem. Soc., 150, C61 (2003).
24. E. J. Ahn and J. J. Kim, Electrochem. Solid-State Lett., 7, C118 (2004).
25. Z. Hu and T. Ritzdorf, in Electrochemical Processing in ULSI and MEMS, H. Deligianni, S. T. Mayer, T. P. Moffat, and, G. R. Stafford, Editors, PV 2004-17, p.13, The Electrochemical Society Proceedings Series, Pennington, NJ (2005).
26. D. Josell, C. R. Beauchamp, D. R. Kelly, C. A. Witt, and T. P. Moffat, Electrochem. Solid-State Lett., 8, C54 (2005).
27. L. W. Graham, Ph.D. Thesis, Rensselaer Polytechnic Institute, New York (1999).
28. C.-J. Zhong and M. D. Porter, J. Am. Chem. Soc., 116, 11616 (1994).
29. M. D. Porter, T. B. Bright, D. L. Allara, and C. E. D. Chidsey, J. Am. Chem. Soc., 109, 3559 (1987).
30. C. D. Bain, E. B. Troughton, Y.-T. Tao, J. Evall, G. M. Whitesides, and R. G. Nuzzo, J. Am. Chem. Soc., 111, 321 (1989).
31. C. D. Bain and G. M. Whitesides, J. Am. Chem. Soc., 111, 7164 (1989).
32. J. J. Hickman, P. E. Laibinis, D. I. Auerbach, C. Zou, T. J. Gardner, G. M. Whitesides, and M. S. Wrighton, Langmuir, 8, 357 (1992).
33. C.-J. Zhong and M. D. Porter, Anal. Chem., 67, 709A (1995).
34. H. Rieley and G. K. Kendall, Langmuir, 15, 8867 (1999).
35. T. Ritzdorf, D. Fulton, and L. Chen, in Advanced Metallization Conference (AMC)/1999, M. E. Gross, T. Gessner, N. Kobayashi, and, Y. Yasuda, Editors, p. 101, Materials Research Society Conference Proceedings, Warrendale, PA (2000).