Role of Additives for Copper Damascene Electrodeposition: Experimental Study on Inhibition and Acceleration Effects

Journal of the Electrochemical Society

Volumn 151, Issue 4, 2004, Pages

  Kondo, Kazuo ^a   Matsumoto, Toshiaki ^a   Watanabe, Keiji ^a  

^a OKAYAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION MEASUREMENT; ADDITIVES; CATHODES; COPPER; CURRENT DENSITY; MATHEMATICAL MODELS; METALLIZING; MOLECULES; QUARTZ; SCANNING ELECTRON MICROSCOPY;

FIELD EMISSION-AUGER (FE-AUGER); FIELD EMISSION-SCANNING ELECTRON MICROSCOPY (FE-SEM); PRINTED CIRCUIT BOARDS (PCB); QUARTZ CRYSTAL MICROBALANCE (QCM);

ELECTRODEPOSITION;

EID: 2042442448     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1649235     Document Type: Article

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