Effect of water addition in the spray solution on the synthesis of zirconium-aluminum oxide films prepared by the pyrosol process

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Bizarro, M ^a   Alonso, J C ^a   Fandio J ^a   Ortiz, A ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DECOMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SPRAY GUNS; SYNTHESIS (CHEMICAL); WATER; ZIRCONIUM COMPOUNDS;

CURRENT-VOLTAGE CHARACTERISTICS; METALLIC ACETYLACETONATES; REACTANTS; SPRAY SOLUTION;

THIN FILMS;

EID: 33744825463     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2203200     Document Type: Article

References (44)

1. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys., 89, 5243 (2001).
2. A. I. Kingon, J. P. Maria, and S. K. Streiffer, Nature (London), 406, 1032 (2000).
3. E. B. O. da Rosa, J. Morais, R. P. Pezzi, L. Miotti, and I. J. R. Baumvol, J. Electrochem. Soc., 148, G695 (2001).
4. E. Deloffre, L. Mont́s, G. Ghibaudo, S. Bruỳre, S. Blonkowski, S. B́cu, M. Gros-Jean, and S. Cŕmer, Microelectron. Reliab., 45, 925 (2005).
5. A. Ritz, Surf. Coat. Technol., 174-175, 651 (2003).
6. E. P. Gusev, M. Copel, E. Cartier, I. J. R. Baumvol, C. Drug, and M. A. Gribelyuk, Appl. Phys. Lett., 76, 176 (2000).
7. Y. Z. Hu and S. P. Tay, J. Vac. Sci. Technol. B, 19, 1706 (2001).
8. J. J. Chambers and G. N. Parsons, Appl. Phys. Lett., 77, 2385 (2000).
9. H. Yamada, T. Shimizu, A. Kurokawa, K. Ishii, and E. Suzuki, J. Electrochem. Soc., 150, G429 (2003).
10. K. P. Bastos, J. Morais, L. Miotti, R. P. Pezzi, G. V. Soarez, I. J. R. Baumvol, H. H. Tseng, R. I. Hedge, and P. J. Tobin, Appl. Phys. Lett., 81, 507 (2002).
11. M. Vehkamäki, T. Hänninen, M. Ritala, M. Leskela, T. Sajavaara, E. Rauhala, and J. Keinonen, Chem. Vap. Deposition, 7, 75 (2001).
12. W. J. Qi, R. Nieh, E. Dhamarajan, B. H. Lee, Y. Jeon, L. Kang, K. Onishi, and J. C. Lee, Appl. Phys. Lett., 77, 1704 (2000).
13. J. Morais, E. B. O. da Rosa, L. Miotti, R. P. Pezzi, I. J. R. Baumvol, A. L. P. Rotondaro, M. J. Bevan, and L. Colombo, Appl. Phys. Lett., 78, 2446 (2001).
14. C. S. Desu, P. C. Joshi, and S. B. Desu, J. Electroceram., 10, 209 (2003).
15. W. F. A. Besling, E. Young, T. Conard, C. Zhao, R. Carter, W. Vandervorst, M. Caymax, S. De Gendt, M. Heyns, J. Maes, M. Tuominen, and S. Haukka, J. Non-Cryst. Solids, 303, 123 (2002).
16. J. H. Jun and D. J. Choi, Jpn. J. Appl. Phys., Part 1, 43, 7576 (2004).
17. A. Ortiz and J. C. Alonso, J. Mater. Sci.: Mater. Electron., 13, 7 (2002).
18. A. Ortiz, J. C. Alonso, and E. Haro-Poniatowski, J. Electron. Mater., 34, 150 (2005).
19. M. Bizarro, J. C. Alonso, and A. Ortiz, J. Electrochem. Soc., 152, 179 (2005).
20. M. Langlet and J. C. Jaubert, in Chemistry of Advanced Materials, Pyrosol Process or the Pyrolysis of an Ultrasonically Genrated Aerosol, C. N. R. Rao, Editor, p. 55, Blackwell Scientific, Oxford, England (1993).
21. R. A. Nyquist and R. O. Kagel, in Infrared Spectra of Inorganic Compounds (3800-45 cm-1), Vol., 4, The Dow Chemical Company, pp. 209-211, Academic Press, Midland, MI (1997).
22. T. Maruyama and A. Arai, Appl. Phys. Lett., 60, 322 (1992).
23. Y. C. Kim, H. H. Park, J. S. Chun, and W. J. Lee, Thin Solid Films, 237, 57 (1994).
24. F. F. Bentley, L. D. Smithson, and A. L. Rozek, in Infrared Spectra and Characteristics Frequencies ≈700-300 cm-1; A Collection of Spectra, Interpretation and Bibliography, p. 1564, John Wiley and Sons, New York (1968).
25. L. A. Ṕrez-Maqueda and E. Matijevic, J. Mater. Res., 12, 3286 (1997).
26. R. N. Tauber, A. C. Dunbri, and R. E. Caffrey, J. Electrochem. Soc., 118, 747 (1971).
27. R. Swanapoel, J. Phys. E, 16, 1214 (1983).
28. S. Adachi, in Optical Properties of Crystalline and Amorphous Semiconductors, Chap., Kluwer Academic Publishers, Boston, MA (1999).
29. A. Ortiz, J. C. Alonso, V. Pankov, A. Huanosta, and E. Andrade, Thin Solid Films, 368, 74 (2000).
30. R. B. van Dover, D. V. Lang, M. L. Green, and L. Manchada, J. Vac. Sci. Technol. A, 19, 2779 (2001).
31. G. A. Battiston, G. Carta, R. Gerbasi, M. Porchia, L. Rizzo, and G. Rossetto, J. Phys. IV, 9 (8), 675 (1999).
32. A. G. Nasibulin, L. I. Shurygina, and E. I. Kauppinen, Colloid J., 67, 5 (2005).
33. M. A. Crouch and T. C. DeVore, Chem. Mater., 8, 32 (1996).
34. M. C. Rhoten and T. C. De Vore, Chem. Mater., 9, 1757 (1997).
35. M. W. Chase, Jr., C. A. Davies, J. R. Downey, Jr., D. J. Frurip, R. A. McDonald, and A. N. Syverud, J. Phys. Chem. Ref. Data, 1985, 14.
36. CRC Handbook of Chemistry and Physics, 67th Ed., R. C. Weast, Editor, p. D33, CRC Press, Boca Raton, FL (1986-1987).
37. T. Maruyama and S. Arai, Appl. Phys. Lett., 69, 322 (1992).
38. V. G. Minkina, Inorg. Mater., 29, 1400 (1993).
39. L. Castaeda, J. C. Alonso, A. Ortiz, E. Andrade, J. M. Saniger, and J. G. Bauelos, Mater. Chem. Phys., 77, 938 (2002).
40. A. Ortiz, J. C. Alonso, and C. Falcony, J. Electrochem. Soc., 140, 3014 (2993).
41. A. Ritz, Surf. Coat. Technol., 174-175, 651 (2003).
42. O. Rico-Fuentes, E. Sánchez-Aguilera, C. Velásquez, R. Ortega-Alvarado, J. C. Alonso, and A. Ortiz, Thin Solid Films, 478, 96 (2005).
43. G. Lucovsky, G. B. Rayner, Jr., D. Kang, G. Appel, R. S. Johnson, Y. Zhang, D. E. Sayers, H. Ade, and J. L. Whitten, Appl. Phys. Lett., 79, 1775 (2001).
44. Y. W. Kwon, Y. Li, Y. W. Heo, and D. P. Norton, Thin Solid Films, 489, 99 (2005).