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Journal of Materials Science: Materials in Electronics

Volumn 13, Issue 1, 2002, Pages 7-11

High quality-low temperature aluminum oxide films deposited by ultrasonic spray pyrolysis

(2) Ortiz, A a Alonso, J C a

a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC BREAKDOWN OF SOLIDS; ELLIPSOMETRY; FILM PREPARATION; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); LOW TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PYROLYSIS; REFRACTIVE INDEX; SPRAYING; ULTRASONIC APPLICATIONS;

ALUMINUM ACETYLACETONATE; COULOMBIC POTENTIAL; ELECTRICAL INTEGRITY; ULTRASONIC SPRAY PYROLYSIS;

ALUMINA;

EID: 0036170062 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1013134727665 Document Type: Article

Times cited : (20)

References (28)

1
- 0005944824
- (1992) Appl. Phys. A: Solid. Surf. A , vol.55 , pp. 176
- Zhao, Y.W.¹ Shur, H.²

2
- 0032050545
- (1998) Thin Solid Films , vol.317 , pp. 77
- Kapsa, R.¹ Stará, I.² Zeze, D.³ Gruzza, B.⁴ Matolín, V.⁵

3
- 0000714264
- (1995) Appl. Phys. Lett. , vol.67 , pp. 1624
- Ciliberto, E.¹ Fragala, I.² Rizza, R.³ Spoto, G.⁴ Allen, G.C.⁵

4
- 0027678027
- (1993) Appl. Optics , vol.32 , pp. 5601
- Edlou, S.M.¹ Smajkiewicz, A.² Al-Jumaily, G.A.³

5
- 36448999635
- (1993) Appl. Phys. Lett. , vol.62 , pp. 681
- Kim, J.S.¹ Marzouk, H.A.² Reucroft, P.J.³ Robertson, J.D.⁴ Hamirin, C.E.⁵

6
- 0034227580
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1158
- Gilmer, D.¹ Hobbs, C.² Hedge, R.³ La, L.⁴ Adetutu, O.⁵ Conner, J.⁶ Tiner, M.⁷ Prabhu, L.⁸ Bagchi, S.⁹ Tobin, P.¹⁰

7
- 0000859967
- edited by G. L. Trigg (Wiley-VCH, Berlin)
- (1993) Encyclopedia of Applied Physics , vol.5 , pp. 295
- Ono, Y.A.¹

8
- 0030673287
- (1997) Mat. Res. Soc. Symp. Proc. , vol.446 , pp. 383
- Gordon, R.G.¹ Kramer, K.² Liu, X.³

9
- 0028550386
- (1994) Mater. Chem. Phys. , vol.39 , pp. 85
- Banamara, Z.¹ Gruzza, B.²

10
- 0033338962
- (1999) Surf. Coat. Technol. , vol.116-119 , pp. 716
- Koski, K.¹ Hölsä, J.² Juliet, P.³

11
- 0031094194
- (1997) Surf. Coat. Technol. , vol.90 , pp. 102
- Lin, C.H.¹ Wang, H.L.² Hon, M.H.³

12
- 0038787960
- (1999) J. Appl. Electrochem. , vol.29 , pp. 229
- González, J.A.¹ López, V.² Bautista, A.³ Otero, E.⁴ Nóvoa, X.R.⁵

13
- 0001377692
- (1998) J. Appl. Phys. , vol.83 , pp. 5570
- Four, S.¹ Devine, R.A.B.² Vallier, L.³

14
- 0033748557
- (2000) Thin Solid Films , vol.368 , pp. 74
- Ortiz, A.¹ Alonso, J.C.² Pankov, V.³ Huanosta, A.⁴ Andrade, E.⁵

15
- 0032757944
- (1999) J. Luminesc. , vol.81 , pp. 45
- Ortiz, A.¹ Alonso, J.C.² Pankov, V.³ Albarran, D.⁴

16
- 0033350438
- (1999) J. Mater. Sci.: Mater. Electrón. , vol.10 , pp. 503
- Ortiz, A.¹ Alonso, J.C.² Pankov, V.³

17
- 84918961924
- (1964) J. Electrochem. Soc. , vol.111 , pp. 872
- Pliskin, W.A.¹ Gnall, R.P.²

18
- 0018495392
- (1979) J. Vac. Sci. Technol. , vol.16 , pp. 994
- Aranovich, J.¹ Ortiz, A.² Bube, R.H.³

19
- 0030284806
- (1996) Thin Solid Films , vol.288 , pp. 120
- Patil, P.V.¹ Bendale, D.M.² Puri, R.K.³ Puri, V.⁴

20
- 0029271285
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 244
- Alonso, J.C.¹ Ortiz, A.² Falcony, C.³ Garcia, M.⁴

21
- 36449007376
- (1992) Appl. Phys. Lett. , vol.60 , pp. 322
- Maruyama, T.¹ Arai, S.²

22
- 0028195235
- (1994) Thin Solid Films , vol.237 , pp. 57
- Kim, Y.C.¹ Park, H.H.² Chun, J.S.³ Lee, W.J.⁴

23
- 0017534649
- (1977) J. Vac. Sci. Technol. , vol.14 , pp. 1064
- Pliskin, W.A.¹

24
- 33847571146
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 689
- Pai, P.G.¹ Chao, S.S.² Takagi, Y.³ Lucovsky, G.⁴

25
- 0000272203
- (1992) Appl. Phys. Lett. , vol.60 , pp. 3114
- Lecohier, B.¹ Calpini, B.² Phisippoz, J.M.³ Stumm, T.⁴ Van Der Bergh, H.⁵

26
- 0025470527
- (1990) Thin Solid Films , vol.189 , pp. 161
- Kang, C.J.¹ Chun, J.S.² Lee, W.J.³

27
- 0019056984
- (1980) J. Appl. Phys. , vol.51 , pp. 4830
- Dimaria, D.J.¹ Ghez, R.² Dong, D.W.³

28
- 0242402612
- (1993) Appl. Surf. Sci. , vol.65-66 , pp. 854
- Kim, T.W.¹ Yom, S.S.² Kang, W.N.³ Yoon, Y.S.⁴ Kim, C.⁵ Kim, S.⁶ Yang, I.S.⁷ Wee, Y.J.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.