TaTiOx layers prepared by magnetron sputtering from separate metal targets

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 651-654

  Ritz, A ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

Magnetron; Monolayer; Multilayer; Reactive sputtering; Tantalum oxide; Titanium oxide

Indexed keywords

FLUORESCENCE; LAYERED MANUFACTURING; LIGHT INTERFERENCE; METALLIC FILMS; OPACITY; TITANIUM OXIDES; X RAY ANALYSIS;

REACTIVE SPUTTERINGS;

MAGNETRON SPUTTERING;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144434436     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00402-X     Document Type: Article

References (5)

1. Bergman R.S. Parham T.G. IEE Proc. Part A 140 1993 6
2. Köstlin H. Frank G. Philips Tech. Rev. 41 1983 225-238
3. Köstlin H. Frank G. Hebbinghaus G. Auding H. Denissen K. J. Non-Cryst. Solids 218 1997 347-353
4. Manifacier J.C. Gasiot J. Fillard J.P. J. Phys. E: Sci. Instrum. 9 1976 1002-1004
5. Swanepoel R. J. Phys. E: Sci. Instrum. 16 1983 1122-1214