The effect of the process conditions on the synthesis of zirconium-aluminum oxide thin films prepared by ultrasonic spray pyrolysis

Journal of the Electrochemical Society

Volumn 152, Issue 11, 2005, Pages

  Bizarro, M ^a   Alonso, J C ^a   Ortiz, A ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ALUMINA; BINDING ENERGY; DEPOSITION; FILM PREPARATION; PERMITTIVITY; PH EFFECTS; PYROLYSIS; REFRACTIVE INDEX; SOLUTIONS; SYNTHESIS (CHEMICAL); ULTRASONICS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

CARRIER GAS FLOW RATE; METALLIC ACETYLACETONATES; SOURCE MATERIALS; ULTRASONIC SPRAY PYROLYSIS;

THIN FILMS;

EID: 27944467521     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2039607     Document Type: Article

References (29)

1. A. I. Kingon, J. P. Maria, and S. K. Streiffer, Nature (London), 406, 1032 (2000).
2. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys., 89, 5243 (2001).
3. P. Ctibor, J. Sedlácek, and K. Nuefuss, Ceram. Int., 29, 527 (2003).
4. J. L. Autran, R. Devine, C. Chaneliere, and B. Ballaud, IEEE Electron Device Lett., 18, 447 (1997).
5. B. H. Lee, L. Kang, R. Nieh, W. J. Qi, and J. C. Lee, Appl. Phys. Lett., 76, 1926 (2000).
6. S. A. Campbell, H. S. Kim, D. C. Gilmen, B. He, T. Ma, and W. L. Gladfelter, IBM J. Res. Dev., 43, 383 (1999).
7. Y. Z. Hu and S. P. Tay, J. Vac. Sci. Technol. B, 19, 1706 (2001).
8. R. B. van Dover, D. V. Lang, M. L. Green, and L. Manchada, J. Vac. Sci. Technol. A, 19, 2779 (2001).
9. Y. A. Ono, in Electroluminescence, Encyclopedia of Applied Physics Vol. 5, p. 295, VCH Publishers, Inc., New York (1993).
10. E. B. O. da Rosa, J. Morais, R. P. Pezzi, L. Miotti, and I. S. R. Baumvol, J. Electrochem. Soc., 148, G695 (2001).
11. H. Habazaki, K. Takahiro, S. Yamaguchi, K. Shimizu, P. Skeldon, G. E. Thompson, and G. C. Wood, Philos. Mag. A, 80, 1027 (2000).
12. J. Zhu and Z. G. Liu, Microelectron. Eng., 66, 849 (2003).
13. J. Petry, O. Richard, W. Vadervorst, T. Conard, J. Chen, and V. Cosnier, J. Vac. Sci. Technol. A, 21, 1482 (2003).
14. A. Ortiz and J. C. Alonso, J. Mater. Sci.: Mater. Electron., 13, 7 (2002).
15. A. Ortiz, J. C. Alonso, and E. Haro-Poniatowski, J. Electron. Mater., 34, 1 (2005).
16. M. Langlet and J. C. Joubert, in Chemistry of Advanced Materials, Pyrosol Process or The Pyrolysis of an Ultrasonically Generated Aerosol, C. N. R. Rao, Editor, p. 55, Blackwell Scientific, Oxford (1993).
17. -1), Vol. 4, The Dow Chemical Company, p. 209-211, Academic Press, Midland, MI (1997).
18. -1: A Collection of Spectra, Interpretation and Bibliography, p. 1564, J. Wiley & Sons, New York (1968).
19. T. Maruyama and S. Arai. Appl. Phys. Lett., 60, 322 (2002).
20. L. A. Pérez-Maqueda and E. Matijevic, J. Mater. Res., 12, 3286 (1997).
21. A. Ortiz, J. C. Alonso, V. Pankov, A. Huanosta, and E. Andrade, Thin Solid Films, 368, 74 (2000).
22. M. H. Cho, Y. S. Rho. H. J. Choi, S. W. Nam, D. H. Ko, J. H. Ku, H. C. Kang, D. Y. Noh, C. N. Whang, and J. Jeong, J. Vac. Sci. Technol. A, 20, 865 (2002).
23. O. Renault, L. G. Gosset, D. Rouchon, and A. Ermolirff, J. Vac. Sci. Technol. A, 20, 1867 (2002).
24. S. K. Dey, C. G. Wang, D. Tang, M. J. Kim, R. W. Carpenter, C. Werkhoven, and E. Shero, J. Appl. Phys., 93, 4144 (2003).
25. M. J. Guittet, J. P. Crocombetle, and M. Gautier-Soyer, Phys. Rev. B, 63, 125117 (2001).
26. JCPDS File Card no. 37-1484.
27. JCPDS File Card no. 65-0461.
28. C. Zhao, O. Richard, E. Young, H. Bender, G. Roebben, S. Haukka, S. De Gendt, M. Houssa, R. Carter, W. Tsai, O. Van Der Biest, and M. Heyns, J. Non-Cryst. Solids, 303, 144 (2002).
29. W. F. A. Besling, E. Young, T. Conard, C. Zhao, R. Carter, W. Vandervorst, M. Caymax, S. De Gent, M. Heyns, J. Macs, M. Touminen, and Savi Haukka, J. Non-Cryst. Solids, 303, 123 (2002).