Characterization of high-K dielectric ZrO2 films annealed by rapid thermal processing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1706-1714

  Hu, Yao Zhi ^a   Tay, Sing Pin ^a  

^a MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; LEAKAGE CURRENTS; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

RAPID THERMAL PROCESSING (RTP);

ULTRATHIN FILMS;

EID: 0035441542     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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