The Enhanced Dielectric and Insulating Properties of Al2O 3 Modified Ta2O5 Thin Films

Journal of Electroceramics

Volumn 10, Issue 3, 2003, Pages 209-214

  Desu, Chandra S ^a   Joshi, Pooran C ^a   Desu, Seshu B ^a  

^a University of Massachusetts   (United States)

Author keywords

Dielectric; Tantalum oxide; Thin films

Indexed keywords

ALUMINA; CAPACITANCE; CAPACITORS; LEAKAGE CURRENTS; MICROELECTRONICS; PERMITTIVITY; PYROLYSIS; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY;

STACKED CAPACITORS; TRENCH CAPACITORS;

THIN FILMS;

EID: 1042266016     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JECR.0000011219.91180.4c     Document Type: Article

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