Crystallization kinetics in amorphous (Zr0.62Al0.38)O1.8thin films

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2779-2784

  Van Dover, R B ^a   Lang, D V ^a   Green, M L ^a   Manchanda, L ^a  

^a AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CRYSTALLIZATION; FILM GROWTH; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; MAGNETRON SPUTTERING; PERMITTIVITY; RATE CONSTANTS; SILICA; THERMAL EFFECTS; THIN FILMS; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

CRYSTALLIZATION KINETICS;

AMORPHOUS FILMS;

EID: 0035507333     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1403715     Document Type: Article

References (13)