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Journal of the Electrochemical Society

Volumn 153, Issue 4, 2006, Pages

Air-gap fabrication using a sacrificial polymeric thin film synthesized via initiated chemical vapor deposition

(2) Chan, Kelvin a Gleason, Karen K a,b

a Massachusetts Institute of Technology (United States)

b ELECTROCHEMICAL SOCIETY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR-GAP FABRICATION; CYCLOHEXYL METHACRYLATE; PATTERNING; VOID STRUCTURES;

CHEMICAL VAPOR DEPOSITION; CROSSLINKING; ETCHING; FABRICATION; INFRARED SPECTROSCOPY; PHOTORESISTORS; POLYMERS; PYROLYSIS; SOLUBILITY; SOLVENTS; SYNTHESIS (CHEMICAL);

THIN FILMS;

EID: 33644804848 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2168297 Document Type: Article

Times cited : (33)

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