Fabrication of Microchannels Using Polynorbornene Photosensitive Sacrificial Materials

Journal of the Electrochemical Society

Volumn 150, Issue 9, 2003, Pages

  Wu, Xiaoqun ^a   Reed, Hollie A ^a   Wang, Yong ^a   Rhodes, Larry F ^b   Elce, Ed ^b   Ravikiran, R ^b   Shick, Robert A ^b   Henderson, Clifford L ^a   Bidstrup Allen, Sue Ann ^a   Kohl, Paul A ^a  

^a Georgia Institute of Technology   (United States)

^b Promerus Limited Liability Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; THERMOGRAVIMETRIC ANALYSIS;

MICROCHANNELS;

COPOLYMERS;

EID: 17744412424     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1596955     Document Type: Article

References (9)

1. 1. J. C. McDonald, D. C. Duffy, J. R. Anderson, D. T. Chiu, H. Wu, O. J. A. Schueller, and G. M. Whitesides, Electrophoresis, 21, 27 (2000).
2. V. Dolnik, S. Liu, and S. Jovanovich, Electrophoresis, 21, 41 (2000).
3. M. Koch, A. Evans, and A. Brunnschweiler, Microfluidic Technology and Applications, Chap. 6 and 7, American Technical Publishers Ltd. (Hertfordshire, U.K., 2000).
4. N. F. Raley, J. C. Davidson, and J. W. Balch, Proc. SPIE, 3224, 185 (1997).
5. N. F. Raley, J. C. Davidson, and J. W. Balch, Proc. SPIE, 2639, 40 (1998).
6. P. Pethig, J. P. H. Burt, A. Parton, N. Rizvi, M. S. Talary, and J. A. Tame, J. Micromech. Microeng., 8, 356 (1998).
7. D. Bhusari, H. Reed, M. Wedlake, A. Padovani, S. A. Bidstrup-Allen, and P. Kohl, J. Microelectromech. Syst., 10, 400 (2001).
8. X. Q. Wu, H. A. Reed, L. F. Rhodes, E. Elce, R. Ravikiran, R. A. Shick, C. L. Henderson, S. A. Bidstrup Allen, and P. A. Kohl, J. Electrochem. Soc., 149, G555 (2002).
9. X. Q. Wu, H. A. Reed, L. F. Rhodes, E. Elce, R. Ravikiran, R. A. Shick, C. L. Henderson, S. A. Bidstrup Allen, and P. A. Kohl, J. Appl. Polym. Sci., In press.