Photoinitiation systems and thermal decomposition of photodefinable sacrificial materials

Journal of Applied Polymer Science

Volumn 88, Issue 5, 2003, Pages 1186-1195

  Wu, Xiaoqun ^a   Reed, Hollie A ^a   Rhodes, Larry F ^b   Elce, Ed ^b   Ravikiran, R ^b   Shick, Robert A ^b   Henderson, Clifford L ^a   Bidstrup Allen, Sue Ann ^a   Kohl, Paul A ^a  

^a Georgia Institute of Technology   (United States)

^b Promerus LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COPOLYMERS; ISOTHERMS; PHOTOSENSITIVITY; PYROLYSIS; REACTION KINETICS; THERMOGRAVIMETRIC ANALYSIS;

NORBORNENE; PHOTOINITIATION; PHOTOSENSITIVE SACRIFICIAL MATERIALS; TRIMETHYLBENZOYL PHENYLPHOSPHINE OXIDE;

INITIATORS (CHEMICAL);

COPOLYMER; DECOMPOSITION; KINETICS; THERMAL STABILITY; THERMOGRAVIMETRY;

EID: 0037414357     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.11774     Document Type: Article

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