Crosstalk-based capacitance measurements: Theory and applications

IEEE Transactions on Semiconductor Manufacturing

Volumn 19, Issue 1, 2006, Pages 67-77

  Vendrame, Loris ^b,d   Bortesi, Luca ^b,e   Cattane, Fabrizio ^b   Bogliolo, Alessandro ^a,c  

^a IEEE   (Italy)

^b STMICROELECTRONICS   (Italy)

^c UNIVERSITY OF URBINO   (Italy)

^d Italian Electrotechnical Association (AEI)   (Italy)

^e Non volatile Memory Group

Author keywords

Cross coupling capacitance; Interconnect capacitance; Matching; Process monitoring; Test structure

Indexed keywords

COUPLING CAPACITANCES; PROCESS MONITORING; TEST STRUCTURE;

CHARACTERIZATION; CROSSTALK; ELECTRIC WIRING; MICROPROCESSOR CHIPS; PROCESS CONTROL;

CAPACITANCE MEASUREMENT;

EID: 33144463729     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.863263     Document Type: Conference Paper

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