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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2705-2708

Characterization of fluoropolymers for 157 nm chemically amplified resist

(7) Itani, Toshiro a Toriumi, Minoru a Naito, Takuya a Ishikawa, Seiichi a Miyoshi, Seiro a Yamazaki, Tamio a Watanabe, Manabu a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; DISSOLUTION; ETCHING; LITHOGRAPHY; PHOTORESISTS; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; STRUCTURE (COMPOSITION); TRANSPARENCY;

ABSORPTION COEFFICIENT; CHEMICALLY AMPLIFIED RESIST; DRY-ETCHING RESISTANCE; QUARTZ CRYSTAL MICROBALANCE METHOD; TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION;

FLUORINE CONTAINING POLYMERS;

EID: 0035519174 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1412889 Document Type: Article

Times cited : (23)

References (11)

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