Dissolution inhibitors for 157 nm lithography: A progress report

Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 613-617

  Conley, Will ^a   Miller, Daniel ^a   Chambers, Charles ^b   Trinque, Brian C ^b   Osborn, Brian ^b   Chiba, Takashi ^b   Zimmerman, Paul ^a   Dammel, Ralph ^c   Romano, Andrew ^c   Grant Willson, C ^b  

^a International SEMATECH   (United States)

^b UNIVERSITY OF TEXAS   (United States)

^c CLARIANT CORPORATION   (United States)

Author keywords

157nm resist; Carbon monoxide copolymers; Dissolution inhibitor; DNQ; Polyfluoronorbornane

Indexed keywords

FLUOROCARBON; POLYMER;

ANALYTIC METHOD; ARTICLE; DISSOLUTION; IMAGING; LITHOGRAPHY; MATERIALS; MATERIALS TESTING; PHOTOCHEMISTRY;

EID: 0036361607     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.613     Document Type: Article

References (9)