Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3162-3165

  Jablonski, Erin L ^a   Prabhu, Vivek M ^a   Sambasivan, Sharadha ^a   Lin, Eric K ^a   Fischer, Daniel A ^a   Goldfarb, Dario L ^b   Angelopoulos, Marie ^b   Ito, Hiroshi ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE (NEXAFS) SPECTROSCOPY; SURFACE SEGREGATION;

COPOLYMERS; DISSOLUTION; ELECTRON EMISSION; ENERGY GAP; GLASS TRANSITION; HOMOPOLYMERIZATION; HYDROPHOBICITY; KINETIC ENERGY; LITHOGRAPHY; ORGANIC SOLVENTS; POLYMER BLENDS; SPIN COATING; SURFACE CHEMISTRY; SURFACE TENSION; WETTING; X RAY SPECTROSCOPY;

PHOTORESISTS;

EID: 0942289199     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (6)

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3. A. Karim, T. M. Slawecki, S. K. Kumar, J. F. Douglas, S. K. Satija, C. C. Hau, T. P. Russell, Y. Liu, R. Overney, J. Sokolov, and M. H. Rafailovich, Macromolecules 31, 857 (1998).
4. J. L. Lenhart, R. L. Jones, E. K. Lin, C. L. Soles, W.-I. Wu, D. A. Fischer, S. Sambasivan, D. L. Goldfarb, and M. Angelopolous, J. Vac. Sci. Technol. B 20, 2920 (2002).
5. H. Ito, H. D. Truong, M. Okazaki, D. C. Miller, N. Fendler, P. J. Brock, G. M. Wallraff, C. E. Larson, and R. D. Allen, J. Photopolym. Sci. Technol. 15, 591 (2002).
6. E. L. Jablonski, J. L. Lenhart, S. Sambasivan, D. A. Fischer, R. L. Jones, E. K. Lin, W.-l. Wu, D. L. Goldfarb, K. Temple, M. Angelopoulos, and H. Ito [submitted to ULSI proceedings (2003)].