Dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornenes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 600-611

  Hoskins, Trevor ^a   Chung, Won Jae ^a   Ludovice, Peter J ^a   Henderson, Clifford L ^a   Seger, Larry D ^b   Rhodes, Larry F ^b   Shick, Robert A ^b  

^a Georgia Institute of Technology   (United States)

^b Promerus LLC   (United States)

Author keywords

Bis trifluoromethyl carbinol; Dissolution rate; Hexafluoroisopropanol; HFA; Hydrogen bonding; Inhibition; PAG

Indexed keywords

ADDITIVES; DISSOLUTION; FLUORINE CONTAINING POLYMERS; HYDROGEN BONDS; MOLECULES; PHOTORESISTS;

BISTRIFLUOROMETHYL CARBINOL SUBSTITUTED POLYNORBORNENES; DISSOLUTION INHIBITORS; HOMOPOLYMER; PHOTOACID GENERATORS;

PHOTOLITHOGRAPHY;

EID: 0141834700     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485145     Document Type: Conference Paper

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