Contribution of bottom-emitted radicals to the deposition of a film on the SiO2 sidewall during CHF3 plasma etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 713-719

  Lee, Gyeo Re ^a   Min, Jae Ho ^a   Lee, Jin Kwan ^a   Kang, Se Koo ^a   Moon, Sang Heup ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MASS SPECTROMETRY; PLASMA ETCHING; PROBABILITY;

BOTTON-EMITTED RADICALS; FILM DEPOSITION; SIDEWALL SURFACES;

SILICA;

EID: 31044448417     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1946712     Document Type: Article

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