Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas

Thin Solid Films

Volumn 374, Issue 2, 2000, Pages 303-310

  Takahashi, Kazuo ^a   Itoh, Atsushi ^a   Nakamura, Toshihiro ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; FLUOROCARBONS; INFRARED SPECTROSCOPY; LASER APPLICATIONS; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; PLASMAS; POLYMERIZATION; REACTION KINETICS;

FLUOROCARBON FILMS; PLASMA POLYMERIZATION; RADICAL KINETICS;

PLASTIC FILMS;

EID: 0034292239     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01160-3     Document Type: Article

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