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Volumn 20, Issue 4, 2002, Pages 1420-1425
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Behavior of fluorocarbon species near temperature controlled and radio frequency biased metal plate in C4F8plasma
a
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Author keywords
[No Author keywords available]
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Indexed keywords
DENSITY (SPECIFIC GRAVITY);
ELECTRIC POTENTIAL;
ETCHING;
FREE RADICALS;
INDUCTIVELY COUPLED PLASMA;
IONS;
MASS SPECTROMETRY;
PLASMA INTERACTIONS;
PLATE METAL;
SURFACES;
TEMPERATURE;
GAS RESIDENCE TIME;
INDUCTIVELY COUPLED PLASMA SYSTEM;
PLASMA WALL INTERACTION;
QUADRUPOLE MASS ANALYZER;
RADIO FREQUENCY BIASED METAL PLATE;
RF BIAS VOLTAGE;
STAGE TEMPERATURE;
FLUOROCARBONS;
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EID: 0036649521
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1487869 Document Type: Article |
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Times cited : (6)
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References (11)
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