Temperature sensitivity of SOI-CMOS transistors for use in uncooled thermal sensing

IEEE Transactions on Electron Devices

Volumn 52, Issue 12, 2005, Pages 2784-2790

  Socher, Eran ^a   Beer, Salomon Michel ^a   Nemirovsky, Yael ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

CMOS; Silicon on insulator (SOB; Temperature coefficient of current; Thermal censors

Indexed keywords

APPROXIMATION THEORY; CMOS INTEGRATED CIRCUITS; MATHEMATICAL MODELS; SENSORS; SILICON ON INSULATOR TECHNOLOGY; TEMPERATURE;

CMOS TRANSISTORS; TEMPERATURE COEFFICIENT OF CURRENT; TEMPERATURE SENSITIVITY; THERMAL SENSORS;

MOSFET DEVICES;

EID: 29244460085     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.859664     Document Type: Article

References (40)

1. T. Akiyama, U. Staufer, N. F. de Rooij, D. Lange, C. Hagleitner, O. Brand, H. Baltes, A. Tonin, and H. R. Hidber, "Integrated atomic force microscopy array probe with metal-oxide-semiconductor field effect transistor stress sensor, thermal bimorph actuator, and on-chip complementary metal-oxide-semiconductor electronics," J. Vac. Sci. Technol. B, Microelectron. Process Phenom., vol. 18, no. 6, pp. 2669-2675, Nov. 2000.
2. A. Witvrouw, F. Van Steenkiste, D. Maes, L. Haspeslagh, P. Van Gerwen, P. De Moor, S. Sedky, C. Van Hoof, A. C. de Vries, A. Verbist, A. De Caussemaeker, B. Parmentier, and K. Baert, "Why CMOS-integrated transducers? A review," Microsyst. Technol., vol. 6, no. 5, pp. 192-199, Aug. 2000.
3. R. H. Kingston, Detection of Optical and Infrared Radiation. New York: Springer-Verlag, 1978.
4. P. W. Cruse and D. D. Skatrud, Eds., "Uncooled infrared imaging arrays and systems," in Semiconductors and Semimetals. New York: Academic, 1997, vol. 47.
5. A. Yaradanakul, Z. Çelik-Butler, and D. P. Butler, "Uncooled infrared microbolometers on flexible substrates," IEEE Trans. Electron Devices, vol. 49, no. 9, p. 930, Sep. 2002.
6. D. Sabuncuoglu Tezcan, S. Eminoglu, and T. Akin, "A low cost uncooled infrared microbolometer detector in standard CMOS technology," IEEE Trans. Electron Devices, vol. 50, no. 2, pp. 494-502, Feb. 2003.
7. y bolometer for thermal imaging applications," Proc. SPIE, vol. 5578, pp. 298-308, Dec. 2004.
8. D. F. Murphy, M. Ray, J. Wyles, J. F. Asbrock, C. Hewitt, R. Wyles, E. Gordon, T. Sessler, A. Kennedy, S. T. Baur, D. Van Lue, S. Anderson, R. Chin, H. Gonzales, C. Le Pere, S. Ton, and T. Kostrzewa, "Performance improvements for VOx microbolometer FPAs," Proc. SPIE, vol. 5406, pp. 531-540, Aug. 2004.
9. M. Kohin and N. R. Butler, "Performance limits of uncooled VOx microbolometer focal plane arrays," Proc. SPIE, vol. 5406, pp. 447-453, Aug. 2004.
10. J.-L. Tissot, A. Crastes, C. Trouilleau, B. Fieque, and S. Tinnes, "Multipurpose high-performance 160 × 120 uncooled IRFPA," Proc. SPIE, vol. 5406, pp. 550-556, Aug 2004.
11. C. M. Hanson, H. R. Beratan, and J. F. Belcher, "Uncooled infrared imaging using thin film ferroelectrics," Proc. SPIE, vol. 4288, pp. 298-303, Jun. 2001.
12. 3 thin film ferroelectric microbolometers for uncooled chopperless infrared sensing," Proc. SPIE, vol. 4130, pp. 140-151, Dec. 2000.
13. M. A. Todd, P. P. Donohue, R. Watton, D. J. Williams, C. J. Anthony, and M. G. Blamire, "High-performance ferroelectric and magnetoresistive materials for next-generation thermal detector arrays," Proc. SPIE, vol. 4795, pp. 88-99, Dec. 2002.
14. M. G. Fujitsuka, J. Sakata, Y. Miyachi, K. Mizuno, K. Ohtsuka, Y. Taga, and O. Tabata, "Monolithic pyroelectric infrared image sensor using PVDF thin film," in Proc. Solid-State Sensors and Actuators, Jun. 1997, pp. 1237-1240.
15. D. T. Chang, D. M. Chen, F. H. Lin, W. J. Kaiser, and O. M. Statsudd, "CMOS integrated infrared sensor," in Proc. Solid-State Sensors and Actuators, Jun. 1997, pp. 1259-1262.
16. C. M. Hanson, "Hybrid pyroelectric-ferroelectric bolometer arrays," Semicond. Semimet., vol. 47, pp. 123-174, 1997.
17. D. L. Polla and J. R. Choi, "Monolithic pyroelectric bolometer arrays," Semicond. Semimet., vol. 47, pp. 175-201, 1997.
18. J. R. Kohli, C. Wuethrich, K. Brooks, B. Willing, M. Forster, P. Muralt, N. Setter, and P. Ryser, "Pyroelectric thin-film sensor array," Sens. Actuators A, Phys., vol. 60, pp. 147-153, 1997.
19. H. Baltes, O. Paul, and O. Brand, "Micromachined thermally based CMOS microsensors," Proc. IEEE, vol. 86, no. 8, pp. 1660-1678, Aug. 1998.
20. U. Munch, D. Jaeggi, K. Schneeberger A. Schaufelbuhl, O. Paul, H. Baltes, and J. Jasper, "Industrial fabrication technology for CMOS infrared sensor arrays," in Proc. Solid-State Sensors Actuators, 1997, pp 205-208.
21. W. G. Baer, K. Najafi, K. D. Wise, and R. S. Toth, "A 32-element micro machined thermal imager with on-chip multiplexing," Sens. Actuators A, Phys., vol. 48, pp. 47-54, 1995.
22. M. Muller, W. Budde, R. Gottfried-Gottfried, A. Hubel, R. Jahne, and H. Kuck, "A thermoelectric infrared radiation sensor with monolithically integrated amplifier stage and temperature sensor," Sens. Actuators A Phys., vol. 54, pp. 601-605, 1996.
23. M. Muller, R. Gottfried-Gottfried, H. Kuck, and W. Mokwa, "A fully CMOS-compatible infrared sensor fabricated on SIMOX substrates," Sens. Actuators A, Phys., vol. 41-42, pp. 538-541, 1994.
24. R. Lenggenhager, H. Baltes, and T. Elbel, "Thermoelectric infrared sensors in CMOS technology," Sens. Actuators A, Phys., vol. 37-38, pp 216-220, 1993.
25. W. van Herwaarden, D. C. van Duyn, B. W. van Oudheusden, and P. M. Sarro, "Integrated thermopile sensors," Sens. Actuators A, Phys., vol 21-23, pp. 621-630, 1989.
26. H. Choi and K. D. Wise, "A silicon-thermopile-based infrared sensing array for use in automated manufacturing," IEEE Trans. Electron Devices, vol. ED-33, no. 1, pp. 72-79, Jan. 1986.
27. E. Socher, O. Degani, and Y. Nemirovsky, "Optimal design and noise considerations of CMOS compatible IR thermoelectric sensors," Sens. Actuators A, Phys., vol. 71, pp. 107-115, 1998.
28. E. Socher, O. Bochobza-Degani, and Y. Nemirovsky, "Optimal performance of CMOS compatible IR thermoelectric sensors," IEEE J. Microelectromech. Syst., vol. 9, no. 3, pp. 38-46, Mar. 2000.
29. E. Socher, O. Bochobza-Degani, and Y. Nemirovsky, "A novel spiral CMOS compatible micromachined thermoelectric IR microsensor," J. Micromech. Microeng., vol. 11, pp. 574-576, 2001.
30. E. Socher, Y. Sinai, and Y. Nemirovsky, "A low-cost CMOS compatible serpentine-structured polysilicon-based microbolometer array," in Proc. IEEE 12th Int. Conf. Solid-State Sensors, Actuators and Microsystems (Transducers'03), vol. 1, Boston, Jun. 8-12, 2003, pp. 320-323.
31. E. Socher, O. Degani, and Y. Nemirovsky, "TMOS-Infrared uncooled sensor and focal plane array," patent pending, PCT IL 2004/000 142.
32. E. Socher, "Investigation of microelectrothermal devices and their application in uncooled thermal imaging," Ph.D. dissertation, Technion - Israel Inst. Technol., Haifa, Israel, 2005.
33. Y. Taur and T. H. Ning, Fundamentals of Modem VLSI Devices. Cambridge, U.K.: Cambridge Univ. Press, 1998.
34. S. Villa, A. L. Lacaita, L. M. Perron, and R. Bez, "A physically based model of the effective mobility in heavily doped n-MOSFET's," IEEE Trans. Electron. Devices, vol. 45, no. 1, pp. 110-115, Jan. 1998. Jan.
35. D. J. Wouters, J. P. Collinge, and H. E. Maes, "Subthreshold slope in thin-film SOI MOSFET's," IEEE Trans. Electron Devices, vol. 37, no. 9, pp. 2022-2033, Sep. 1990.
36. D. Flandre, "Silicon-on-insulator technology for high temperature metal oxide semiconductor devices and circuits," in High-Temperature Electronics, R. Kirschman, Ed. New York: IEEE Press, 1998, pp. 303-308.
37. T. Rudenko, V. Kilchytska, J. P. Colinge, V. Dessard, and D. Flandre, "On the high-temperature subthreshold slope of thin-film SOI MOSFETs," IEEE Electron Device Lett., vol. 23, no. 3, pp. 148-150, Mar. 2002.
38. J. B. Kuo, W. C. Lee, and J. Sim, "Back-gate bias effect on the subthreshold behavior and the switching performance in an ultrathin SOI CMOS inverter operating at 77 and 300 K," IEEE Trans. Electron Devices, vol. 39, no. 12, pp. 2781-2790, Dec. 1992.
39. Tower Semiconductors, Ltd. [Online]. Available:http://www.towersemi.com/
40. ELTRAN Process for SOI Wafers. [Online]. Available: http://www.canon.com/ technology/detail/device/soi/