Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry

Journal of Physics D: Applied Physics

Volumn 38, Issue 24, 2005, Pages 4278-4289

  Czerwiec, T ^a,b   Greer, F ^a   Graves, D B ^a  

^a University of California   (United States)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DISSOCIATION; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; MIXTURES;

ACTINOMETRY; NITROGEN ATOM PRODUCTION;

NITROGEN;

EID: 29144468977     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/38/24/003     Document Type: Article

References (61)

1. Blant A V, Hughes O H, Cheng T S, Novikov S V and Foxon C T 2000 Plasma Sources Sci. Technol. 9 12
2. Sasaki K, Kokubu H, Hayashi D and Kadota K 2001 Thin Solid Films 386 243
3. Gupta J A et al 2002 J. Cryst. Growth 242 141
4. Carrere H, Arnoult A, Ricard A and Bedel-Pereira E 2002 J. Cryst. Growth 243 295
5. Kim Y K, Baek J M and Lee K H 2001 Surf. Coat. Technol. 142-144 321
6. Greer F, Fraser D, Coburn J W and Graves D B 2003 J. Vac. Sci. Technol. A 21 96
7. Meikle S and Hatanaka Y 1989 Appl. Phys. Lett. 54 1648
8. Ricard A, Oseguera-Pena J E, Falk L, Michel H and Gantois M 1990 IEEE Trans. Plasma Sci. 18 940
9. Czerwiec T, Gavillet J, Belmonte T, Michel H and Ricard A 1996 J. Phys. III 6 1205
10. McCullough R W, Geddes J, Croucher J A, Woolsey J M, Higgins D P, Schlapp M and Gilbody H B 1996 J. Vac. Sci. Technol. A 14 152
11. Higgins D P, McCullough R W, Geddes J, Schlapp M, Woolsey J, Salzborn E and Gilbody H B 1995 Nucl. Instrum. Methods Phys. Res. B 79 508
12. Douai D, Berndt J and Winter J 2002 Plasma Sources Sci. Technol. 11 60
13. Henriques J, Tatarova E, Dias F M and Ferreira C M 2002 J. Appl. Phys. 91 5632
14. Voulot D, McCullough R W, Thompson W R, Burns D, Geddes J, Gosimini G J, Nelson E, Chow P P and Klaassen J 1998 J. Vac. Sci. Technol. A 16 3434
15. Kota G, Coburn J W and Graves D B 1999 J. Appl. Phys. 85 74
16. Imai F, Kunimori K and Nozoye H 1995 J. Vac. Sci. Technol. A 13 2508
17. MacKinnon K A 1929 Phil. Mag. 8 605
18. Kortshagen U, Gibson N B and Lawler J E 1996 J. Phys. D: Appl. Phys. 29 1224
19. Xu S, Ostrikov K N, Luo W and Lee S 2000 J. Vac. Sci. Technol. A 18 2185
20. Czerwiec T and Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827
21. Ostrikov K N, Xu S and Azam A B M 2002 J. Vac. Sci. Technol. A 20 251
22. Coburn J W and Chen M 1980 J. Appl. Phys. 51 3134
23. D'Agostino, Cramarossa F, De Benedictis S and Ferraro G 1981 J. Appl. Phys. 53 1259
24. Walkup R E, Saenger K L and Selwyn G S 1986 J. Chem. Phys. 84 2668
25. Booth J P, Joubert O and Pelletier J 1991 J. Appl. Phys. 69 618
26. Granier A, Chéreau D, Henda K, Safari R and Leprince P 1994 J. Appl. Phys. 75 104
27. St-Onge L and Moisan M 1994 Plasma Chem. Plasma Proc. 14 87
28. Gicquel A, Chenevier M, Assouni K, Tserepi A and Dubus M 1998 J. Appl. Phys. 83 7504
29. Katsch H M, Tewes A, Quandt E, Goehlich A, Kawetzki T and Dobele H F 2000 J. Appl. Phys. 88 6232
30. Grunthaner F J, Bicknell-Tassius R, Deelman P, Grunthaner P J, Bryson C, Snyder E, Giuliani J L, Apruzese J P and Kepple P 1998 J. Vac. Sci. Technol. A 16 1615
31. Thomaz C, Amorim J and Souza C F 1999 J. Phys. D: Appl. Phys. 32 3208
32. Singh H, Coburn J W and Graves D B 1999 J. Vac. Sci. Technol. A 17 2427
33. Vaudo R P, Yu Z, Cook J W and Schetzina J F 1993 Opt. Lett. 18 1843
34. Vaudo R P, Cook J W and Schetzina J F 1994 J. Vac. Sci. Technol. B 12 1232
35. Malyshev M V and Donnelly V M 1997 J. Vac. Sci. Technol. A 15 550
36. Malyshev M V and Donnelly V M 1999 Phys. Rev. E 60 6016
37. Catherinot A and Sy A 1979 Phys. Rev. A 20 1511
38. Bengtsson G J, Larson J, Svanberg S and Wang D D 1992 Phys. Rev. A 45 2712
39. Niemi K, Schulz-von der Gathen V and Dobele H F 2001 J. Phys. D: Appl. Phys. 34 2330
40. Bruce M R, Layne W B, Whitehead C A and Keto T W 1990 J. Chem. Phys. 92 2917
41. Musielok J, Wiese W L and Veres G 1995 Phys. Rev. 51 3588
42. Wiese W L, Brault J W, Danzmann K, Helbig V and Koch M 1989 Phys. Rev. A 39 2461
43. Lofthus A and Krupenie P H 1977 J. Phys. Chem. Ref. Data 6 113
44. Adams S F and Miller T A 1998 Chem. Phys. Lett. 295 305
45. Sadeghi N, Setzer D W, Francis A, Czarnetzki U and Dobele H F 2001 J. Chem. Phys. 115 3144
46. Frost R M, Awakowicz P, Summers H P and Badnell N R 1998 J. Appl. Phys. 84 2989
47. Filippelli A R, Sharpton F A and Lin C C 1982 J. Chem. Phys. 76 3597
48. Chilton J E, Boffard J B, Schappe R S and Lin C C 1998 Phys. Rev. A 57 267
49. Feltsan P V and Zapesochnhyi I P 1967 Ukr. Fiz. Zh. 12 633
50. Boffard J B, Piech G A, Gehrke M F, Lagus M A, Anderson L W and Lin C C 1996 J. Phys. B 29 L795
51. Boffard J B, Piech G A, Gehrke M F, Anderson L W and Lin C C 1999 Phys. Rev. A 59 2749
52. Stewart R S and Smith D J 2002 J. Phys. D: Appl. Phys. 35 1777-87
53. Itikawa Y, Hayashi M, Ichimura A, Onda K, Sakimoto K, Takayanagi K, Nakamura M, Nishimura H and Takayanagi T 1986 J. Phys. Chem. Ref. Data 15 985
54. Leroy O, Perrin J, Jolly J, Pealat M and Lefebvre M 1997 J. Phys. D: Appl. Phys. 30 499
55. Kearns D M, Gillen D R, Voulot D, McCullough R W, Thompson W R, Cosimini G J, Nelson E, Chow P P and Klaassen J 2001 J. Vac. Sci. Technol. A 19 993
56. Itagaki N, Iwata S, Muta K, Yonesu A, Kawakami S, Ishii N and Kawai Y 2003 Thin Solid Films 435 259
57. De Jong H J 1974 Chem. Phys. Lett. 25 129
58. Czerwiec T, Michel H and Bergmann E 1998 Surf. Coat. Technol. 108-109 182-90
59. Henriques J, Tatarova E, Dias F M and Ferreira C M 2002 J. Appl. Phys. 91 5622
60. Ptak A J, Ziemer K S, MIllecchia M R, Stinespring C D and Myers T H 1999 MRS Internet J. Nitride Semicond. Res. 4S1.G3.10
61. Godfroid Th, Dauchot J P and Hecq M 2003 Surf. Coat. Technol. 174-175 1276