Plasma diagnostics pf pulsed d.c. glow discharge combined with ICP for deep nitriding process

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 321-327

  Kim, Yoon Kee ^a   Baek, Jong Moon ^a   Lee, Keun Ho ^a  

^a Institute for Advanced Engineering (IAE)   (South Korea)

Author keywords

Inductively coupled plasma (ICP); Plasma deep nitriding; Plasma diagnostics

Indexed keywords

CASE HARDENING; CATHODES; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; GLOW DISCHARGES; INDUCTIVELY COUPLED PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA SOURCES; PRESSURE EFFECTS;

OPTICAL EMISSION SPECTROSCOPY (OES);

NITRIDING;

NITRIDING; PLASMA TREATMENT;

EID: 0035387378     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01083-0     Document Type: Article

References (15)