Fundamental beam studies of radical enhanced atomic layer deposition of TiN

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 1, 2003, Pages 96-105

  Greer, Frank ^a   Fraser, D ^a   Coburn, J W ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ATOMS; DEPOSITION; PROBABILITY; STOICHIOMETRY; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

DEUTERIUM ATOMS; FILM DEPOSITION; NITROGEN ATOMS; RADICAL ENHANCED ATOMIC LAYER DEPOSITION;

TITANIUM NITRIDE;

EID: 0037273562     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1524145     Document Type: Article

References (17)

1. T. Suntola and J. Antson, U.S. Patent No. 4,058,430 (1977)
2. M. Ritale et al., J. Electrochem. Soc. 147, 3377 (2000).
3. A. Sherman, U.S. Patent No. 5,916,365 (1999).
4. S. Kang, ALD 2001 Conference Proceedings. Monterey, CA.
5. S. M. Rossnagel et al., J. Vac. Sci. Technol. B 18, 2016 (2000).
6. F. Greer, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 18 2288 (2000).
7. J. Aarik, et al., Appl. Surf. Sci. 172, 148 (2001).
8. A. Rahtu, T. Alaranta, and M. Ritala, Langmuir 17, 6506 (2001).
9. A. Rahtu and M. Ritala, Appl. Phys. Lett. 80, 521 (2002).
10. G. Kota, J. W. Coburn, and D. B. Graves, J. Appl. Phys. 85, 74 (1999).
11. T. Suntola et al., Appl. Surf. Sci. 60/61, 742 (1992).
12. G. Castellan, Phys. Chem. 3 428 (1983).
13. X. Satta et al., Materials Research Society 2000 Spring Meeting.
14. C. Rettner, J. Chem. Phys. 101, 2 (1994).
15. CRC Handbook of Chemistry and Physics, edited by D. R. Lide (Chemical Rubber Corp., Boca Raton, 2000)
16. H. Niimi and G. Lucovsky, J. Vac. Sci. Technol. B 17, 6 (1999).
17. T. Seino, T. Matsuura, and J. Murota, Appl. Phys. Lett. 76, 342 (2000).