Low-pressure, high-density plasma nitriding: Mechanisms, technology and results

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 182-190

  Czerwiec, T ^a   Michel, H ^a   Bergmann, E ^b  

^a UNIVERSITÉ DE LORRAINE   (France)

^b Ecole d'Ingenieurs de Geneve   (Switzerland)

Author keywords

Diagnostics; Low pressure high density plasma assisted nitriding processes; Plasma surface interactions; Surface modification

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FATIGUE OF MATERIALS; GLOW DISCHARGES; HARDNESS; ION IMPLANTATION; METALLURGY; PLASMA DENSITY; PLASMA SOURCES; SURFACE TREATMENT; TRIODES; WEAR RESISTANCE;

HIGH-DENSITY PLASMA NITRIDING; LOW-PRESSURE PLASMA NITRIDING; PLASMA IMMERSION ION IMPLANTATION (PIII); PLASMA SOURCE ION IMPLANTATION (PSII); THERMIONIC ARC DISCHARGES (TAD); THERMIONICALLY-ASSISTED TRIODE (TAT) ARRANGEMENTS;

NITRIDING;

EID: 0040142260     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00555-6     Document Type: Article

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