Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 993-997

  Kearns, D M ^a   Gillen, D R ^a   Voulot, D ^a   McCullough, R W ^a   Thompson, W R ^a   Cosimini, G J ^b   Nelson, E ^b   Chow, P P ^b   Klaassen, J ^b  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^b SVT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; DISSOCIATION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; GAS DISCHARGE TUBES; MASS SPECTROMETERS; OXYGEN; POSITIVE IONS; SPECTRUM ANALYSIS; ULTRAHIGH VACUUM;

ELECTRON FLUXES;

PLASMA SOURCES;

EID: 0035335487     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1367263     Document Type: Article

References (11)