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Volumn 20, Issue 3, 2002, Pages 865-872

Annealing effects of aluminum silicate films grown on Si(100)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; FILM GROWTH; SEMICONDUCTING SILICON; SPUTTERING; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036565032     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1472422     Document Type: Article
Times cited : (30)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.