Quantitative analysis on the growth of negative ions in pulse-modulated SiH4 plasmas

Industrial and Engineering Chemistry Research

Volumn 44, Issue 21, 2005, Pages 7907-7915

  Kim, Dong Joo ^a   Kim, Kyo Seon ^a  

^a Kangwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; NEGATIVE IONS; POLYMERIZATION; PULSE MODULATION; SILICON COMPOUNDS; THIN FILMS;

CHEMICAL SPECIES; GENERATION REACTION; MODEL EQUATIONS; POLYMERIZATION REACTIONS;

PLASMAS;

CHEMICAL ENGINEERING;

EID: 27444447915     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie0503803     Document Type: Article

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