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Surface and Coatings Technology

Volumn 183, Issue 2-3, 2004, Pages 196-203

Target poisoning during reactive magnetron sputtering: Part III: The prediction of the critical reactive gas mole fraction

(2) Depla, D a De Gryse, R a

a GHENT UNIVERSITY (Belgium)

Author keywords

Modelling; Reactive; Sputtering magnetron; Target poisoning

Indexed keywords

DISCHARGE (FLUID MECHANICS); IMPURITIES; ION IMPLANTATION; MAGNETRON SPUTTERING;

ELECTRONEGATIVITY; GAS MOLE FRACTION;

COATINGS;

COATING;

EID: 2442471907 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2003.10.008 Document Type: Article

Times cited : (35)

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