Reactive deposition of nitrides and oxides using a twin-cathode inverted cylindrical magnetron

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 484-488

  Lindberg, V W ^a   Woodard, A R ^a   Glocker, D A ^b  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b Isoflux Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; GLASS; MAGNETRON SPUTTERING; SUBSTRATES;

REACTIVE SPUTTERING; TWIN-CATHODE INVERTED CYLINDRICAL MAGNETRONS;

PROTECTIVE COATINGS;

SPUTTERING;

EID: 0034310640     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00920-8     Document Type: Article

References (10)

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