Quantitative modeling of reactive sputtering process for MgO thin film deposition

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 59-63

  Matsuda, Y ^a   Otomo, K ^a   Fujiyama, H ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

MgO; Modeling; Reactive sputtering; Secondary electron emission

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; FILM PREPARATION; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; SECONDARY EMISSION; SPUTTER DEPOSITION; THIN FILMS;

REACTIVE SPUTTERING;

MAGNESIA;

EID: 0035973344     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00925-7     Document Type: Article

References (13)