Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering

Vacuum

Volumn 51, Issue 2, 1998, Pages 157-160

  Hotovy I ^a   Huran, J ^c   Janik J ^a   Kobzev, A P ^b  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; OXYGEN; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; SPUTTER DEPOSITION;

NICKEL OXIDE; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0032182399     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00190-0     Document Type: Article

References (7)

1. Fujii, E., Tomozawa, A., Torii, H. and Takayama, R., Jpn. J. Appl. Phys., 1996, 35, L328.
2. Sato, H., Minami, T., Takata, S. and Yamada, T., Thin Solid Films, 1993, 236, 27.
3. Kitao, M., Izawa, K., Urabe, K., Komatsu, T., Kuwano, S. and Yamada, S., Jpn. J. Appl. Phys., 1994, 33, 6656.
4. Kumagai, H., Matsumoto, M., Toyoda, K. and Obara, M., Journal of Materials Science Letters, 1996, 15, 1081.
5. Fujii, E., Tomazawa, A., Fujii, S., Torii, H., Hattori, M. and Takayama, R., Jpn. J. Appl. Phys., 1993, 32, L1448.
6. Meng, L. J., Azavedo, A. and dos Santos, M. P., Vacuum, 1995, 46, 233.
7. Chastain, J., Handbook of X-ray Photoelectron Spectroscopy, Perkin Elmer, Minnesota, 1992.